![]() |
ßäåðíà ô³çèêà òà åíåðãåòèêà
ISSN:
1818-331X (Print), 2074-0565 (Online) |
Home page | About |
Ìagnetronic (ionic) pulverization method
S. L. Grishin, V. P. Òokarev
Institute for Nuclear Research of the National Academy of Sciences of UkraineAbstract: The experimental examination of the opportunity of targets manufacture from any high-melting materials and alloys with the help of the ionic pulverization method is described. The considerable advantages are shown in the comparison to usual methods of raising dust.
References:1. Holland L. The Vacuum Deposition of Thin Films (John Wiley and Sons Inc., New York, 1956).
2. Kay E. Advan. Electron. Phys. 17 (1962) 245.
3. Francombe M. H. Basic Problems Thin Film Physics (Vandenhoeck and Ruprecht, Goettingen, 1966) p. 52.